高周波スパッタリング法により作製したCdSe含有SiO_2ガラス薄膜の三次の非線形光学効果における微粒子粒径の影響

概要

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CdSe microcrytsals with various sizes was successfully embedded in SiO_2 glass matrix by magnetron rf-sputtering technique. The mean size of microcrystals was controllable by changing the relative surface area ratio of the CdSe chips to the matrix in the target, and increased with increasing the relative area. The negative eal part of the third-order optical susceptibility was seen for all of the present films, and the magnitude of the absolute value of real part increased with increasing concentration of CdSe. The imaginary part due to wo photon absorption also increased with the CdSe concentration. After normalized with respect to the oncentration, it was revealed that actual optical third-order nonlinearity of the CdSe microcrystals increased as the mean size decreased, in other words as the quantum confinement effect increased.
社団法人日本セラミックス協会の論文
2002-10-01