Electrical Resistivity Minimum in Amorphous Iron Films
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概要
- 論文の詳細を見る
- 社団法人日本物理学会の論文
- 1974-08-15
著者
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Yoshiie Toshimasa
Department Of Material Physics Faculty Of Engineering Science Osaka University
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Fujita F.
Department Of Material Physics Faculty Of Engineering Science Osaka University
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YAMAKAWA Kohji
Department of Material Physics,Faculty of Engineering Science,Osaka University
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Yamakawa Kohji
Department Of Material Physics Faculty Of Engineering Science Osaka University
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Yamakawa Kohji
Department Of Material Physics Faculty Of Engineering Science 0saka University
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- Electrical Resistance Decay and Structural Change of Au-Si Thin Films Induced by Air
- Electrical Resistivity Minimum in Amorphous Iron Films
- The Mossbauer Effect of Fe-V and Fe-Cr Sigma Phase
- Diffusion of Hydrogen in Hydrogen-Quenched Nickel
- Recovery Process of Iron Films Deposited on Low Temperature Substrate
- Recovery of the Quenched-In Solute Hydrogen Atoms in Nickel
- Recovery of Quenched-In Solute Hydrogen in Nickel Thin Plate
- Recovery Process in Thin Films of Noble Metals Vacuum-Deposited on Low Temperature Substrate
- Diffusion of Deuterium and Isotope Effect in Nickel
- Recovery of Pure Iron Quenched-in Liquid Hydrogen