Yoshiie Toshimasa | Department Of Material Physics Faculty Of Engineering Science Osaka University
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概要
関連著者
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Yoshiie Toshimasa
Department Of Material Physics Faculty Of Engineering Science Osaka University
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Yoshiie T
Kyoto Univ. Osaka Jpn
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KIRITANI Michio
Department of Nuclear Engineering, School of Engineering, Nagoya University
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Kiritani M
Department Of Electronic Engineering Hiroshima Institute Of Technology
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Kiritani Michio
Department Of Electrnics Hiroshima Institute Of Technology
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Fujita F.
Department Of Material Physics Faculty Of Engineering Science Osaka University
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YAMAKAWA Kohji
Department of Material Physics,Faculty of Engineering Science,Osaka University
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Yamakawa Kohji
Department Of Material Physics Faculty Of Engineering Science Osaka University
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Yamakawa Kohji
Department Of Material Physics Faculty Of Engineering Science 0saka University
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Kojima Satoshi
Department Of Cardiology Juntendo Shizuoka Hospital
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Okada Akira
Department of Systems Science, Tokyo Institute of Technology
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Kojima Satoshi
Department Of Nuclear Engineering School Of Engineering Nagoya University
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Satoh Yuhki
Department Of Pharmacy Oita University Hospital
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Satoh Yuhki
Department Of Nuclear Engineering School Of Engineering Nagoya University
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Okada Akira
Department Of Environmental Design. Faculty Of Science Of Living. Osaka City University
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Hamada Kohichi
Department of Precision Engineering, Faculty of Engineering, Hokkaido University
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Hamada K
Institute Of Atomic Energy Kyoto University
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Kojima S
Nihon Univ.
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Kojima Satoshi
Department Bf Physics Faculty Of Science And Engineering Ritsumeikan University
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Okada A
Kinki Univ. School Of Medicine Osaka Jpn
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Okada Akira
Department Of Electrical And Electronic Engineering Faculty Of Science And Engineering Saga Universi
著作論文
- The Effect of Planar Sinks on the Interstitial Loop Growth under High Temperature Neutron Irradiation
- Fission-Fusion Correlation in Mechanical Property Changes of Several Pure FCC Metals
- Electrical Resistance Decay and Structural Change of Au-Si Thin Films Induced by Air
- Electrical Resistivity Minimum in Amorphous Iron Films