DSMC Analysis of Rarefied Flows of Chlorine in a Parallel-Plate RF Etcher for 300mm Wafer

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概要

• 論文の詳細を見る
• 東北大学の論文

著者

• ナンブ ケンイチ

  Professor Institute Of Fluid Science Tohoku University

• スエタニ マサハル

  Student, Graduate School of Tohoku University

• スエタニ マサハル

  Student Graduate School Of Tohoku University

関連論文

• Particle-in-Cell/Monte Carlo Simulation of Pulsed Chlorine Discharge
• Coulomb-Collision Incorporated Simulation of a Rapid Expansion of Fully Ionized Plasmas
• Detailed Modeling of Ion and Neutral Radicals in Radio-Frequency CF4 Discharge
• Effect of Positive-Negative Ion Recombination on RF Chlorine Discharge
• Particle Model for Inductively Coupled Plasma
• DSMC Analysis of Rarefied Flows of Chlorine in a Parallel-Plate RF Etcher for 300mm Wafer
• Dynamics of Three-Dimensional DC Magnetron Discharge Plasma
• Self-consistent Particle Simulation of Axisymmetrical Magnetron Discharge
• Experimental Analysis of Radial and Axial Structures of DC Glow Discharge
• Virtual Plasma Reactor-Computer Simulated RF Etcher

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