Ultranarrow Silicon Inverse Taper Waveguide Fabricated with Double-Patterning Photolithography for Low-Loss Spot-Size Converter
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2012-05-25
著者
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Mori Masahiko
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Kamei Toshihiro
Research Center For Ubiquitous Mems And Micro Engineering National Institute Of Advanced Industrial
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Sakakibara Youichi
Photonics Research Institute National Institute Of Advanced Industrial Science And Technology
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Sakakibara Youichi
Network Photonics Research Center National Institute Of Advanced Industrial Science And Technology
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TAKEI Ryohei
Network Photonics Research Center, National Institute of Advanced Industrial Science and Technology
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OMODA Emiko
Network Photonics Research Center, National Institute of Advanced Industrial Science and Technology
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SUZUKI Masao
Network Photonics Research Center, National Institute of Advanced Industrial Science and Technology
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MANAKO Shoko
Network Photonics Research Center, National Institute of Advanced Industrial Science and Technology
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KAMEI Toshihiro
Network Photonics Research Center, National Institute of Advanced Industrial Science and Technology
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MORI Masahiko
Network Photonics Research Center, National Institute of Advanced Industrial Science and Technology
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Omoda Emiko
Network Photonics Research Center National Institute Of Advanced Industrial Science And Technology
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Kamei Toshihiro
Network Photonics Research Center National Institute Of Advanced Industrial Science And Technology
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Manako Shoko
Network Photonics Research Center National Institute Of Advanced Industrial Science And Technology
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Takei Ryohei
Network Photonics Research Center National Institute Of Advanced Industrial Science And Technology
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Mori Masahiko
Network Photonics Research Center National Institute Of Advanced Industrial Science And Technology
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Suzuki Masao
Network Photonics Research Center National Institute Of Advanced Industrial Science And Technology
関連論文
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- Ultranarrow Silicon Inverse Taper Waveguide Fabricated with Double-Patterning Photolithography for Low-Loss Spot-Size Converter