Influence of Gas Flow Ratio in PE-CVD Process on Mechanical Properties of Silicon Nitride Film
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概要
- 論文の詳細を見る
- 2008-05-01
著者
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ISONO Yoshitada
Department of Micro System Technology, Faculty of Science and Engineering, Ritsumeikan University
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Oh Hyun-jin
Department Of Micro System Technology Faculty Of Science And Engineering Ritsumeikan University
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NAMAZU Takahiro
Division of Mechanical System, Department of Mechanical and System Engineering, Graduate School of E
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SAITO Yoshihiro
Research and Development Division, and Optical Transmission Components Division, Sumitomo Electric I
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YAMAGUCHI Akira
Research and Development Division, and Optical Transmission Components Division, Sumitomo Electric I
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Isono Yoshitada
Department Of Micro System Technology Faculty Of Science And Engineering Ritsumeikan University
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Isono Yoshitada
Department Of Engineering Ritsumeikan University
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Namazu Takahiro
Division Of Mechanical System Department Of Mechanical And System Engineering Graduate School Of Eng
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Yamaguchi Akira
Research And Development Division And Optical Transmission Components Division Sumitomo Electric Ind
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Saito Yoshihiro
Research And Development Division And Optical Transmission Components Division Sumitomo Electric Ind
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