Conductance Spectroscopy Study on Interface Electronic States of HfO_2/Si Structures : Comparison with Interface Dipole

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2009-03-25

著者

• MIYATA Noriyuki

  Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Tec

• ABE Yasuhiro

  Graduate School of Engineering, Musashi Institute of Technology

• YASUDA Tetsuji

  Nanoelectronics Research Institute (NeRI), National Institute of Advanced Industrial Science and Tec

関連論文

• Conductance Spectroscopy Study on Interface Electronic States of HfO_2/Si Structures : Comparison with Interface Dipole
• Photoassisted Scanning Tunneling Spectroscopy Study on the Local Spot Strucutres in Thin HfO2 Film on Si
• Conductance Spectroscopy Study on Interface Electronic States of HfO2/Si Structures: Comparison with Interface Dipole

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