Improved Photoconduction Effects of Nanometer-Sized Si Dot Multilayers
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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Koshida Nobuyoshi
Tokyo Univ. Agriculture And Technol. Tokyo Jpn
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HIRANO Yoshiyuki
NHK Science & Technical Research Laboratories
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Hirano Yoshiyuki
Nhk Science And Technical Research Laboratories
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Yamazaki Susumu
Nhk Science And Technical Research Laboratories
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Koshida Nobuyoshi
Tokyo University Of Agriculture And Technology
関連論文
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- Focused Ion Beam Lithography with Transition Metal Oxide Resists : Lithography Technology
- Improved Photoconduction Effects of Nanometer-Sized Si Dot Multilayers
- Focused Ion Beam Lithography with Transition Metal Oxide Resists
- Improved Photoconduction Effects of Nanometer-Sized Silicon Dot Multilayers