Abrupt metal insulator transition of TiO_2 and Al_xTi_<1-x>O_y thin films
スポンサーリンク
概要
- 論文の詳細を見る
- 2007-09-19
著者
-
LIM Jung
Teraelectronics device Team, IT-Convergence & Components Laboratory, Electronics and Telecommunicati
-
Lee Yong
Teraelectronics Device Team It-convergence & Components Laboratory Electronics And Telecommunica
-
Yun Sun
Teraelectronics Device Team It-convergence & Components Laboratory Electronics And Telecommunica
-
Kim Hyun
Teraelectronics Device Team It-convergence & Components Laboratory Electronics And Telecommunica
-
KIM Bong
Teraelectronics device Team, IT-Convergence & Components Laboratory, Electronics and Telecommunicati
-
Kim Bong
Teraelectronics Device Team It-convergence & Components Laboratory Electronics And Telecommunica
-
Lim Jung
Teraelectronics Device Team It-convergence & Components Laboratory Electronics And Telecommunica
-
Lim Jung
Teraelectronic Devices Team, Electronics and Telecommunications Research Institute, 161 Gajung-dong, Yusong-gu, Daejon 305-350, Korea
-
Yun Sun
Teraelectronic Devices Team, Electronics and Telecommunications Research Institute, 161 Gajung-dong, Yusong-gu, Daejon 305-350, Korea
関連論文
- Stability of Phosphorus-doped p-ZnO thin films
- Abrupt metal insulator transition of TiO_2 and Al_xTi_O_y thin films
- Vanadium Dioxide Films Deposited on Amorphous SiO2- and Al2O3-Coated Si Substrates by Reactive RF-Magnetron Sputter Deposition