Epitaxial High-K Oxide Metal Gate MOSFETs : Damascene CMP Process Integration and Electrical Results
スポンサーリンク
概要
- 論文の詳細を見る
- 2006-09-13
著者
-
Schwalke Udo
Institute For Semiconductor Technology Darmstadt University Of Technology
-
Schwalke Udo
Institute For Semiconductor Technology And Nanoelectronics Darmstadt University Of Technology
-
ENDRES Ralf
Institute for Semiconductor Technology and Nanoelectronics, Darmstadt University of Technology
-
STEFANOV Yordan
Institute for Semiconductor Technology and Nanoelectronics, Darmstadt University of Technology
-
Endres Ralf
Institute For Semiconductor Technology And Nanoelectronics Darmstadt University Of Technology
-
Stefanov Yordan
Institute For Semiconductor Technology And Nanoelectronics Darmstadt University Of Technology
関連論文
- Epitaxial High-K Oxide Metal Gate MOSFETs : Damascene CMP Process Integration and Electrical Results
- Self-aligned Fabrication Process for Pd-Contacted and PMMA-Passivated Carbon Nanotube Field-Effect Transistors
- Topographic and Conductive AFM Measurements on Carbon Nanotube Field-Effect Transistors Fabricated by In-situ Chemical Vapor Deposition
- Polymethyl Methacrylate Passivation of Carbon Nanotube Field-Effect Transistors: Novel Self-Aligned Process and Effect on Device Transfer Characteristic Hysteresis
- Carbon Nanotube Transistor Fabrication Assisted by Topographical and Conductive Atomic Force Microscopy