STEFANOV Yordan | Institute for Semiconductor Technology and Nanoelectronics, Darmstadt University of Technology
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概要
- STEFANOV Yordanの詳細を見る
- 同名の論文著者
- Institute for Semiconductor Technology and Nanoelectronics, Darmstadt University of Technologyの論文著者
関連著者
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Schwalke Udo
Institute For Semiconductor Technology Darmstadt University Of Technology
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Schwalke Udo
Institute For Semiconductor Technology And Nanoelectronics Darmstadt University Of Technology
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STEFANOV Yordan
Institute for Semiconductor Technology and Nanoelectronics, Darmstadt University of Technology
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Stefanov Yordan
Institute For Semiconductor Technology And Nanoelectronics Darmstadt University Of Technology
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Hess Gisela
Institute For Semiconductor Technology Darmstadt University Of Technology
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Heller Rudolf
Institute For Semiconductor Technology Darmstadt University Of Technology
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ENDRES Ralf
Institute for Semiconductor Technology and Nanoelectronics, Darmstadt University of Technology
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Endres Ralf
Institute For Semiconductor Technology And Nanoelectronics Darmstadt University Of Technology
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RISPAL Lorraine
Institute for Semiconductor Technology, Darmstadt University of Technology
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TZSCHOCKEL Gerhard
Institute for Semiconductor Technology, Darmstadt University of Technology
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HABERLE Klaus
Institute for Semiconductor Technology, Darmstadt University of Technology
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Stefanov Yordan
Institute For Semiconductor Technology Darmstadt University Of Technology
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Rispal Lorraine
Institute For Semiconductor Technology Darmstadt University Of Technology
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Tzschockel Gerhard
Institute For Semiconductor Technology Darmstadt University Of Technology
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Haberle Klaus
Institute For Semiconductor Technology Darmstadt University Of Technology
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Rispal Lorraine
Institute for Semiconductor Technology and Nanoelectronics, Darmstadt University of Technology, Schlossgartenstrasse 8, D-64289, Germany
著作論文
- Epitaxial High-K Oxide Metal Gate MOSFETs : Damascene CMP Process Integration and Electrical Results
- Topographic and Conductive AFM Measurements on Carbon Nanotube Field-Effect Transistors Fabricated by In-situ Chemical Vapor Deposition