Effects of Base Oxide and Silicon Composition on Charge Trapping in HfSiO/SiO_2 High-k Gate Stacks
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概要
- 論文の詳細を見る
- 2004-09-15
著者
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CHEN M.
Department of Electrical and Electronic Engineering, Gifu University
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Chen S.
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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WU W.
Department of Electronics Engineering, National Chiao Tung University
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WANG M.
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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HOU T.
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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YAO L.
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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JIN Y.
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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LIANG M.
Advanced Module Technology Division, Taiwan Semiconductor Manufacturing Company
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Chen M.
Department Of Electronics Engineering National Chiao Tung University
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Liang M.
Advanced Module Technology Division Taiwan Semiconductor Manufacturing Company
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Chen M.
Department Of Electrical And Electronic Engineering Gifu University
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