Characterization of Pore Size Distributions in Ultralow-k Films
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概要
- 論文の詳細を見る
- 2004-09-15
著者
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Kikkawa T.
Mirai Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And T
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FUJII N.
MIRAI, Association of Super-Advanced Electronics Technologies (ASET)
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HATA N.
MIRAI, Advanced Semiconductor Research Center (ASRC)
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MIYOSHI H.
MIRAI, Association of Super-Advanced Electronics Technologies (ASET)
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LI X.
ASRC, AIST
関連論文
- Formation of Mesoporous Pure Silica Zeolite Film
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- Recovery of Process-induced Damages of Porous Silica Low-k Films by TMCTS Vapor Annealing
- Characterization of pore sealing effect on trench sidewalls in porous low-k films by vapor adsorption in-situ spectroscopic ellipsometry
- Characterization of Pore Size Distributions in Ultralow-k Films