Characterization of pore sealing effect on trench sidewalls in porous low-k films by vapor adsorption in-situ spectroscopic ellipsometry
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概要
- 論文の詳細を見る
- 2006-09-13
著者
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HATA N.
MIRAI, Advanced Semiconductor Research Center (ASRC)
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Kanayama T.
Mirai-advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc
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Sumiya K.
Consortium For Advanced Semiconductor Materials And Related Technologies (casmat)
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KOGA K.
Consortium for Advanced Semiconductor Materials and Related Technologies (CASMAT)
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TAKADA S.
MIRAI-Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST)
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TADA M.
Consortium for Advanced Semiconductor Materials and Related Technologies (CASMAT)
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KAWAMOTO Y.
Consortium for Advanced Semiconductor Materials and Related Technologies (CASMAT)
関連論文
- Formation of Mesoporous Pure Silica Zeolite Film
- Characterization of pore sealing effect on trench sidewalls in porous low-k films by vapor adsorption in-situ spectroscopic ellipsometry
- Characterization of Pore Size Distributions in Ultralow-k Films