Integrating Diffusionless Anneals Into Advanced CMOS Technologies

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概要

• 論文の詳細を見る
• 2004-09-15

著者

• Dachs C.

  Philips Research Leuven

• Severi S.

  Imec

• PAWLAK B.

  Philips Research Leuven

• MCCOY S.

  Mattson Technology Canada

• GELPEY J.

  Mattson Technology Canada

• SURDEANU R.

  Philips Research Leuven

• LINDSAY R.

  IMEC

• SATTA A.

  IMEC

• LAUWERS A.

  IMEC

• HENSON K.

  IMEC

• MCCOY S.

  Vortek Industries

• GELPEY J.

  Vortek Industries

• PAGES X.

  ASM International

関連論文

• Integration of ultra shallow junctions in PVD TaN nMOS transistors with Flash Lamp Annealing
• Integrating Diffusionless Anneals Into Advanced CMOS Technologies
• Study of Dopant Diffusion and Defect Evolution for Advanced Ultra Shallow Junctions based on Atomistic Modeling
• A Double-Gate device architecture optimization for sub-45nm digital CMOS technologies using cell-based timing analysis

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