Optoelectronic Properties and Nanostructure Formation of σ-Conjugated Polymers

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Nanowire Formation and Selective Adhesion on Substrates by Single-Ion Track Reaction in Polysilanes
Photo-Induced Reaction Dynamics in Poly (di-n-hexylsilylene) by Excimer Laser Flash Photolysis
Dependence of Outgassing Characters at a 157 nm Exposure on Resist Structures
Delocalization of Positive and Negative Charge Carriers on Oligo- and Poly-fluorenes Studied by Low-Temperature Matrix Isolation Technique
Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application
Relationship between Sensitivities of Chemically Amplified Resist Based on Adamantane Derivatives upon Exposure to ArF Excimer Laser, Electron Beam, and Extreme Ultraviolet Radiation
Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248nm and Dry/Wet 193nm Resists
Negative Resist Material Based on Polysilanes for Electron Beam and X-Ray Lithographies
Noise Analysis of Si-Based Planar-Type Ion-Channel Biosensors
Si-Based Planer Type Ion-channel Biosensors
Formation of Nanowires Based on π-Conjugated Polymers by High-Energy Ion Beam Irradiation
Optoelectronic Properties and Nanostructure Formation of σ-Conjugated Polymers
Formation of Conjugated Double Bonds in Poly(vinyl alcohol) Film under Irradiation with γ-Rays at Elevated Temperature
Noise Analysis of Si-Based Planar-Type Ion-Channel Biosensors
Formation of Nanowires Based on $\pi$-Conjugated Polymers by High-Energy Ion Beam Irradiation
Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application

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