Formation Process of Highly Reliable Ultra-Thin Gate Oxide
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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Ohmi T.
Department Of Electronics Faculty Of Engineering Tohoku University
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Ohmi K.
Department Of Electronics Faculty Of Engineering Tohoku University
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Ohmi T.
Department Of Electronic Eng. Graduate School Of Eng. Tohoku University
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IWAMOTO T.
Department of Electronics, Faculty of Engineering, Tohoku University
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YABUNE T.
Department of Electronics, Faculty of Engineering, Tohoku University
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MIYAKE T.
Department of Electronics, Faculty of Engineering, Tohoku University
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Yabune T.
Department Of Electronics Faculty Of Engineering Tohoku University
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