Application of CVD SiO_2 Single Layer Films to Inter-Poly Dielectrics of Flash Memories

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概要

• 論文の詳細を見る
• 1995-08-21

著者

• Yugami J.

  Central Research Laboratory Hitachi Ltd.

• Kume H.

  Central Research Laboratory Hitachi Ltd.

• KOBAYASHI T.

  Central Research Laboratory, Hitachi Ltd.

• KIMURA K.

  Central Research Laboratory, Hitachi Ltd.

• USHIYAMA M.

  Central Research Laboratory, Hitachi, Ltd.

• MIYAMOTO N.

  Hitachi Device Engineering Co.

• YUGAMI J.

  Central Research Laboratory, Hitachi, Ltd.

関連論文

• The Increase of the Native Oxide Thickness of H-Terminated Si Surfaces by Gaseous Contamination in a Clean Room Atmosphere
• Scaling of Flash Memory Interpoly Dielectrics Using NH_3-Annealed CVD SiO_2 Single-Layer Films
• Application of CVD SiO_2 Single Layer Films to Inter-Poly Dielectrics of Flash Memories

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