Preparation and Characterization of Iridium Oxide Thin Films by DC Reactive Sputtering

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概要

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1996-08-26

著者

Lee M.
Process Development Team 2 Semiconductor R&d Center Samsung Electronics Co. Ltd
Lee S.
Process Development Team 2 Semiconductor R&d Center Samsung Electronics Co. Ltd
PARK S.
Process Development Team, Semiconductor R&D Division, Samsung Electronics co., ltd.
CHO H-J.
Process Development Team 2, Semiconductor R&D Center, Samsung Electronics Co., LTD
HORII H.
Process Development Team 2, Semiconductor R&D Center, Samsung Electronics Co., LTD
KANG C.
Process Development Team 2, Semiconductor R&D Center, Samsung Electronics Co., LTD
KIM J.
Process Development Team 2, Semiconductor R&D Center, Samsung Electronics Co., LTD
LEE B.
Process Development Team 2, Semiconductor R&D Center, Samsung Electronics Co., LTD
HWANG C.
Process Development Team 2, Semiconductor R&D Center, Samsung Electronics Co., LTD
Cho H-j.
Process Development Team 2 Semiconductor R&d Center Samsung Electronics Co. Ltd
Kim J.
Process Development Team 2 Semiconductor R&d Center Samsung Electronics Co. Ltd
Horii H.
Process Development Team 2 Semiconductor R&d Center Samsung Electronics Co. Ltd
PARK S.
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.

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