Impacts of Chlorine in CVD-TiN Gate Electrode on the Gate Oxide Reliability in Multiple-Thickness Oxide Technology

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概要

• 論文の詳細を見る
• 2000-08-28

著者

• Moriwaki Masaru

  Ulsi Process Technology Development Center Matsushita Electronics Corporation

• Yamada Takayuki

  Ulsi Process Technology Development Center Semiconductor Company Matsushita Electronics Corp.

関連論文

• Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WN_x Gate Formation
• Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WNx Gate Formation
• Impacts of Chlorine in CVD-TiN Gate Electrode on the Gate Oxide Reliability in Multiple-Thickness Oxide Technology
• Influences of Residual Chlorine in CVD-TiN Gate Electrode on the Gate Oxide Reliability in Multiple-Thickness Oxide Technology

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