Nanolaminated Ta_2O_5-Al_2O_3 Insulator Effect on Luminescent and Electrical Properties of Thin-Film Electroluminescent Devices
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-07-15
著者
-
Yun Sun
Basic Research Laboratory Etri
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KIM Yong
Basic Research Laboratory, Electronics and Telecommunications Research Institute
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Yun Sun
Basic Research Laboratory Electronics And Telecommunications Research Institute (etri)
関連論文
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- Stability of Phosphorus-doped p-ZnO thin films
- Vanadium Dioxide Films Deposited on SiO_2- and Al_2O_3-coated Si Substrates Using Reactive RF-Magnetron Sputter Deposition Technique
- 20pWG-12 Mott metal-insulator transition (MIT) & structural phase transition (SPT) : analysis of coherent phonons in VO_2
- 20pWG-13 Separation of Mott metal-insulator transition and structural phase transition in VO_2
- 28aUE-9 Mott transition observed by micro-Raman scattering in VO_2
- Low-Voltage dc Thin-Film Electroluminescence with an Indium-Tin-Oxide/CaS:Pb/ZnS/Al Structure
- Nanolaminated Ta_2O_5-Al_2O_3 Insulator Effect on Luminescent and Electrical Properties of Thin-Film Electroluminescent Devices