TeO_X-Based Film for Heat-Mode Inorganic Photoresist Mastering
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-05-15
著者
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Ohno Eiji
Materials And Devices Laboratory Matsushita Electric Industrial Co. Ltd.
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Ohno Eiji
Storage Media Systems Development Center Matsushita Electric Industrial Co. Ltd.
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Ito Eiichi
Optical Disk Systems Development Center. Matsushita Electric Ind. Co. Ltd.
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ITO Eiichi
Storage Media Systems Development Center, Matsushita Electric Industrial Co., Ltd.
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KAWAGUCHI Yuko
Storage Media Systems Development Center, Matsushita Electric Industrial Co., Ltd.
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TOMIYAMA Morio
Storage Media Systems Development Center, Matsushita Electric Industrial Co., Ltd.
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ABE Shinya
Storage Media Systems Development Center, Matsushita Electric Industrial Co., Ltd.
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- High Speed Overwritable Phase Change Optical Disk Material : MEDIA
- Study on 40 Gbits/inch^2 Density Molding Using Heat Insulated Mold
- TeO_X-Based Film for Heat-Mode Inorganic Photoresist Mastering
- Master Recording for High-Density Disk Using 248 nm Laser Beam Recorder
- 50 GB Read Only Memory Disc with Dual Layer Structure
- The Recording of Tiny Marks Less Than 100 nm on Magneto-optical Medium Sputtered from RE-TM Alloy Target
- TeOX-Based Film for Heat-Mode Inorganic Photoresist Mastering
- Study on 100 Gbit/inch2 Density Molding Using Double-Sided Heat Insulated Mold
- Study on 40 Gbits/inch2 Density Molding Using Heat Insulated Mold
- 50 GB Read Only Memory Disc with Dual Layer Structure