Random Deposition Model with a Constant Capture Length(Condensed Matter and Statistical Physics)
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概要
- 論文の詳細を見る
We introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance l, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical properties is provided, thanks to capture equations and to the analysis of the island-island distance distribution.
- 理論物理学刊行会の論文
- 2005-01-25
著者
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Saito Yukio
Department of Internal Medicine II, University of Yamanashi
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Politi Paolo
Istituto Dei Sistemi Complessi Cnr:istituto Nazionale Per La Fisica Della Materia Udr Firenze:depart
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Saito Yukio
Department Of Electrical Engineering And Electronics Aoyama Gakuin University
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