Design and Characteristics of Polysilicon Emitter Bipolar Junction Transistors
スポンサーリンク
概要
- 論文の詳細を見る
Through the aid of empirical equations, a process simulator and a device simulator, a polysilicon (p-Si) emitter bipolar junction transistor (PEBJT) suitable for mass-production has been designed, fabricated, and characterized. The device with an emitter size of 5 μm $\times$ 9 μm has more than 1 order flatness of $h_{\text{FE}}$ vs. IC, and has more than 4 orders flatness with an emitter size of 9 μm $\times$ 9 μm The ideality factors of the collector current are around 1 for the operating temperature ranging from 24°C to 125°C, with base to emitter applied voltage = 0.4–0.5.
- Japan Society of Applied Physicsの論文
- 2003-10-15
著者
関連論文
- Amorphous Silicon/Silicon-Carbide Separated Absorption and Multiplication Region Avalanche Photodiode with Additional Doped Superlattice
- Design and Characteristics of Polysilicon Emitter Bipolar Junction Transistors
- Effect of Oxygen Contents on the Properties of Al-Doped ZnO Films Prepared by Low Temperature Magnetic Controlled DC Sputtering
- Optical and Magnetic Properties of Hydrothermally Synthesized Al-Doped ZnO Nanorods