Stability of Postannealed Silicon Dioxide Electret Thin Films Prepared by Magnetron Sputtering
スポンサーリンク
概要
- 論文の詳細を見る
- Japan Institute of Metalsの論文
- 2002-05-01
著者
-
Ohbayashi Yoshiaki
Technical & Research Division Hosiden Corporation
-
MINAMI Tadatsugu
Optoelectronic Device System R&D Center, Kanazawa Institute of Technology
-
MIYATA Toshihiro
Optoelectronic Device System R&D Center, Kanazawa Institute of Technology
-
TODA Hidenobu
Optoelectronic Device System Research & Development Center, Kanazawa Institute of Technology
-
UTSUBO Tetsuharu
Optoelectronic Device System Research & Development Center, Kanazawa Institute of Technology
-
Toda H
Optoelectronic Device System Research & Development Center Kanazawa Institute Of Technology
-
Utsubo Tetsuharu
Optoelectronic Device System Research & Development Center Kanazawa Institute Of Technology
-
Minami Tadatsugu
Optoelectronic Device System R&d Center Kanazawa Institute Of Technology
-
Minami Tadatsugu
Optoelectronic Device System Research & Development Center Kanazawa Institute Of Technology
-
Miyata Toshihiro
Optoelectronic Device System R&d Center Kanazawa Institute Of Technology
-
Miyata Toshihiro
Optoelectronic Device System Research & Development Center Kanazawa Institute Of Technology
関連論文
- High-Luminance EL Devices Using Y_2GeO_5 Phosphor Thin Films Prepared by Magnetron Sputtering(Special Issue on Electronic Displays)
- Mn-Activated Y_2O_3-GeO_2 Phosphors for Thin-Film Electroluminescent Devices : Semiconductors
- High-Efficiency Oxide Heterojunction Solar Cells Using Cu_2O Sheets
- Stability of Postannealed Silicon Dioxide Electret Thin Films Prepared by Magnetron Sputtering
- High-Luminance Thin-Film Electroluminescent Devices Using ((Y_2O_3)_-(GeO_2)_):Mn Phosphors : Optics and Quantum Electronics
- High-Luminance Thin Film Electroluminescent Devices Using Monoclinic Y_2O_3 Phosphor Activated with Mn : Optics and Quantum Electronics
- Effect of Driving Frequency on the EL Characteristics of Thick Ceramic Insulating Type TFEL Devices Using Y_2O_3-Based Phosphor Emitting Layer(Electronic Displays)
- High-Luminance Multicolor-Emitting Thin-Film Electroluminescent Devices Using(Y_2 O_3-Ga_2 O_3):Mn Phosphors
- High-Efficiency Oxide Solar Cells with ZnO/Cu_2O Heterojunction Fabricated on Thermally Oxidized Cu_2O Sheets
- High-Luminance EL Devices Using Zn_2Si_Ge_XO_4 : Mn Thin Films Prepared by Combinatorial Deposition by r.f. Magnetron Sputtering with Subdivided Powder Targets(Electronic Displays)
- High-Efficiency Cu₂O-Based Heterojunction Solar Cells Fabricated Using a Ga₂O₃ Thin Film as N-Type Layer
- New Transparent Conducting Al-doped ZnO Film Preparation Techniques for Improving Resistivity Distribution in Magnetron Sputtering Deposition
- High-Efficiency Cu_2O-Based Heterojunction Solar Cells Fabricated Using a Ga_2O_3 Thin Film as N-Type Layer