Residual Stress of TiNi Shape Memory Alloy Thin Films with(111) Single-crystal Silicon Wafer
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概要
- 論文の詳細を見る
- Japan Institute of Metalsの論文
- 2002-03-01
著者
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Wang Li
State Key Laboratory Of Natural And Biomimetic Drugs And School Of Pharmaceutical Sciences Peking Un
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Liu Y
National Inst. For Materials Sci. Tsukuba Jpn
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WU Tingbin
Open Lab of Education Ministry for High-Temperature Materials and Testing, Shanghai Jiao Tong Univer
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JIANG Bohong
Open Lab of Education Ministry for High-Temperature Materials and Testing, Shanghai Jiao Tong Univer
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QI Xuan
Open Lab of Education Ministry for High-Temperature Materials and Testing, Shanghai Jiao Tong Univer
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LIU Yushu
Open Lab of Education Ministry for High-Temperature Materials and Testing, Shanghai Jiao Tong Univer
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XU Dong
Key Lab of Education Ministry for Micro-Processing and Technique, Shanghai Jiao Tong University
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WANG Li
Key Lab of Education Ministry for Micro-Processing and Technique, Shanghai Jiao Tong University
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Qi Xuan
Open Lab Of Education Ministry For High-temperature Materials And Testing Shanghai Jiao Tong Univers
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Wu Tingbin
Open Lab Of Education Ministry For High-temperature Materials And Testing Shanghai Jiao Tong Univers
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Jiang Bohong
Open Lab Of Education Ministry For High-temperature Materials And Testing Shanghai Jiao Tong Univers
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Liu Yushu
Open Lab Of Education Ministry For High-temperature Materials And Testing Shanghai Jiao Tong Univers
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Xu Dong
Key Lab Of Education Ministry For Micro-processing And Technique Shanghai Jiao Tong University
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Wang Li
Key Lab Of Education Ministry For Micro-processing And Technique Shanghai Jiao Tong University
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