アゾベンゼン修飾界面活性剤を用いた高含有Ni/ダイヤモンド複合皮膜
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概要
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The influence of a redox active surfactant (4-Ethylazobenzene-4’-(oxyethyl)trimethylammonium bromide, AZTAB) and a redox inactive surfactant (n-Dodecyltrimethylammonium bromide, DTAB) on the codeposition of diamond particles with nickel has been investigated. A nickel bath containing DTAB did not deposit a higher amount of diamond particles with nickel, whereas the nickel bath containing AZTAB deposited more than twice the amount of the particles (45.5 vol.%) that were deposited by the former bath (21.6 vol.%). An electrochemical investigation showed that AZTAB is reduced during the nickel deposition. Therefore, it has been assumed here that the reduction of free AZTAB at the cathode surface leads to desorption of AZTAB adsorbed on the particles in the vicinity of the cathode. As a result, deposition of these particles at the cathode surface takes place before these particles are being entrapped in the layer of growing nickel.The wear resistance of the Ni/diamond composite coatings containing various volumetric content of particles was also investigated. This showed that a higher degree of wear resistance accompanied increased particle content.
- 一般社団法人 表面技術協会の論文
- 2003-09-01
著者
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Takebe Takashi
Department Of Mathematics Faculty Of Science The University Of Tokyo
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Takebe Takashi
Department Of Chemistry And Materials Science Tokyo Institute Of Technology
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MATSUZAKI Tomohiro
Department of Chemistry and Materials Science, Tokyo Institute of Technology
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SHRESTHA Nabeen
Department of Chemistry and Materials Science, Tokyo Institute of Technology
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SAJI Tetsuo
Department of Chemistry and Materials Science, Tokyo Institute of Technology
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Saji Tetsuo
Department Of Chemistry And Materials Science Tokyo Institute Of Technology
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Saji Tetsuo
Department Of Chemical Engineering Tokyo Institute Of Technology
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Shrestha N
Tokyo Inst. Of Technol. Tokyo
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Shrestha Nabeen
Department Of Chemistry & Materials Science Tokyo Institute Of Technology
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Matsuzaki Tomohiro
Department Of Chemistry And Materials Science Tokyo Institute Of Technology
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建部 隆
Department of Chemistry and Materials Science, Tokyo Institute of Technology
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松崎 智洋
Department of Chemistry and Materials Science, Tokyo Institute of Technology
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