Electrophoretic Deposition of Copper Phthalocyanine from Trifluoroacetic Acid-Dichloromethane Mixed Solution
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概要
- 論文の詳細を見る
- 2000-01-05
著者
-
Saji Tetsuo
Department Of Chemical Engineering Tokyo Institute Of Technology
-
Yamanouchi Hiroaki
Department Of Chemical Engineering Tokyo Institute Of Technology
-
IRIE Kazunobu
Department of Chemical Engineering, Tokyo Institute of Technology
関連論文
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- Formation of Organic Pigment Films by Photochemical Reduction of Surfactants Containing an Azobenzene Group
- Electrophoretic Deposition of Copper Phthalocyanine from Trifluoroacetic Acid-Dichloromethane Mixed Solution
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- ホストミセルに可溶化されたジフェロセニル界面活性剤の電気化学的特性
- Formation of Copper Phthalocyanine Films by Electrophoretic Deposition
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