Conformality of Chemical-Vapor-Deposited Tungsten on TiN Prepared by Metal-organic Chemical Vapor Deposition via Cyclic Plasma Treatment
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-01-15
著者
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Lee Wan-jin
Faculty Of Applied Chemistry And Research Institute For Catalysis Chonnam National University
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Park Jin
Central Research Center Hyundai Microelectronics Co. Ltd.
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WHANG Soon-Hong
Central Research Center, Hyundai Microelectronics Co., Ltd.
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KIM Jun
Central Research Center, Hyundai Microelectronics Co., Ltd.
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KIM Do-Heyoung
Faculty of Applied Chemistry and Research Institute for Catalysis, Chonnam National University
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CHO Dong-Lyun
Faculty of Applied Chemistry and Research Institute for Catalysis, Chonnam National University
関連論文
- Conformality of Chemical-Vapor-Deposited Tungsten on TiN Prepared by Metal-organic Chemical Vapor Deposition via Cyclic Plasma Treatment
- Effect of N_2/H_2 Plasma Treatment on the Properties of TiN Films Prepared by Chemical Vapor Deposition from TiCl_4 and NH_3
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- Conformality of Chemical-Vapor-Deposited Tungsten on TiN Prepared by Metal-organic Chemical Vapor Deposition via Cyclic Plasma Treatment