Determination of Trace Impurities in Graphite and Silicon Carbide by Total Reflection X-ray Fluorescence Spectrometry after Homogeneous Liquid-Liquid Extraction
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概要
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Using homogeneous liquid–liquid extraction as a pre-concentration method, a determination procedure of trace impurities (Fe, Ni and Cu) by total reflection X-ray fluorescence (TXRF) analysis was developed and optimized for graphite and silicon carbide samples. The samples were decomposed by alkali fusion. The residue was dissolved in a mixture of pentadeca-fluorooctanoic acid (PFOA), acetone and water, and the analytes were homogeneously dispersed by the aid of phenanthroline (phen). After phase separation with pH-adjustment, a portion of the sedimented water-immiscible liquid was pipetted on the polyester film that covered a silicon wafer sample-carrier. Then, the droplet was dried in a vacuum and analyzed by TXRF. Analytical values in the sub-ppm or ppm level were well agreed with the certified values of the standard samples or the values observed by ICP-OES for a few samples.
- 社団法人 日本鉄鋼協会の論文
- 2000-08-15
著者
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IGARASHI Shukuro
Department of Materials Science, Faculty of Engineering, Ibaraki University
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Itoh Shinji
National Research Institute For Metals
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Igarashi S
Department Of Molecular Chemistry And Engineering Faculty Of Engineering Tohoku University
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Igarashi Shukuro
Department Of Biomolecular Functional Engineering Faculty Of Engineering Ibaraki University
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YAMAGUCHI Hitoshi
Materials Analysis Station, National Institute for Material Science
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YAMAGUCHI Hitoshi
National Research Institute for Metals
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NAITOH Kunishige
Department of Materials Science, Faculty of Engineering, Ibaraki University
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HASEGAWA Ryosuke
National Research Institute for Metals
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Naitoh Kunishige
Department Of Materials Science Faculty Of Engineering Ibaraki University
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Yamaguchi Hitoshi
Materials Analysis Station National Institute For Material Science
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