Disk Mastering Process with an All-Solid-State Ultraviolet Laser

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1998-04-01

著者

• Kubota S

  Sony Co. Atsugi‐shi Jpn

• Kubota Shigeo

  Research Center Sony Corporation

• KANEDA Yushi

  Research Center, Sony Corporation

• YAMATSU Hisayuki

  Advanced Development Laboratory, Sony Corporation

• FURUKI Motohiro

  Advanced Development Laboratory, Sony Corporation

• KUROKAWA Koutaroh

  Advanced Development Laboratory, Sony Corporation

• KASHIWAGI Toshiyuki

  Advanced Development Laboratory, Sony Corporation

関連論文

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• Organotin-Containing Resists (TMAR) for X-Ray Lithography : Resist Material and Process
• Organotin-Containing Resists (TMAR) for X-Ray Lithography
• Deep UV Mastering Using an All-Solid-State 266 nm Laser for an over 20 GBytes/Layer Capacity Disk
• Disk Mastering Process with an All-Solid-State Ultraviolet Laser
• Second-Harmonic Generation Green Laser for Higher-Density Optical Disks
• Disk Mastering Process with an All-Solid-State Ultraviolet Laser

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