Radical and Ion Compositions of BCl_3/Cl_2 Plasma and Their Relation to Aluminum Etch Characteristics
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-07-01
著者
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KAZUMI Hideyuki
Hitachi Research Laboratory, Hitachi, Ltd.
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Kazumi Hideyuki
Hitachi Research Laboratory Hitachi Ltd.
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Kazumi Hideyuki
Hitachi Research Laboratory Kasado Works Hitachi Ltd.
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HAMASAKI Ryoji
Hitachi Research Laboratory, Kasado Works, Hitachi, Ltd.
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TAGO Kazutami
Hitachi Research Laboratory, Kasado Works, Hitachi, Ltd.
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Tago Kazutami
Hitachi Research Laboratory Kasado Works Hitachi Ltd.
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Hamasaki Ryoji
Hitachi Research Laboratory Kasado Works Hitachi Ltd.
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Hamasaki Ryoji
794, Higashitoyoi Kudamatsu-shi, Yamaguchi 744, Japan
関連論文
- A Novel Plasma Etching Tool with RF-Biased Faraday-Shield Technology : Chamber Surface Reaction Control in the Etching of Nonvolatile Materials
- Radical and Ion Compositions of BCl_3/Cl_2 Plasma and Their Relation to Aluminum Etch Characteristics
- A Novel Plasma Etching Tool with RF-Biased Faraday-Shield Technology: Chamber Surface Reaction Control in the Etching of Nonvolatile Materials