Direct photo-etching of wide band-gap semiconductor by 266nm and VUV-266nm multiwavelength laser ablation

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概要

• 論文の詳細を見る
• 1997-01-01

著者

• ZHANG J.

  Institute of Materials Science, University of Tsukuba

• ZHANG J.

  理化学研究所

• Zhang J

  Department Of Community Health Science Saga Medical School

• SUGIOKA K.

  Institute of Physical and Chemical Research(RIKEN)

• WADA S.

  Institute of Physical and Chemical Research(RIKEN)

• TASHIRO H.

  Institute of Physical and Chemical Research(RIKEN)

• TOYODA K.

  Institute of Physical and Chemical Research(RIKEN)

• Toyoda K

  Department Of Applied Electronics Science University Of Takyo

• Toyoda K.

  Institute for Chemical Research, Kyoto University:(Present address) Faculty of Engineering, Kyoto University

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