Facile Fabrication Procedure for C_<60>-Doped Silicon Oxide Thin Films
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概要
著者
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Hasegawa Isao
Department Of Agricultural And Biological Chemistry College Of Bioresource Sciences Nihon University
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Nitta Shoji
Department Of Electrical And Electronic Engineering Faculty Of Engineering Gifu University
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Nonomura S
Department Of Electrical And Electronic Engineering Faculty Of Engineering Gifu University
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Nonomura Shuichi
Department Of Electronic And Computer Engineering Gifu University
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Hasegawa Isao
Department Of Chemistry Faculty Of Engineering Gifu University
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SHIBUSA Koji
Department of Electrical and Electronic Engineering, Faculty of Engineering, Gifu University
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KOBAYASHI Sastoshi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Gifu University
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Shibusa Koji
Department Of Electrical And Electronic Engineering Faculty Of Engineering Gifu University
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Kobayashi Sastoshi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Gifu University
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NONOMURA Shuichi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Gifu University
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