円筒マグネトロンスパッタ装置で成膜した黒色のチタン薄膜の構造

概要

論文の詳細を見る
In preparation for the fabrication of porous thin-film TiO<SUB>2</SUB> semiconductors, the microstructure and morphology of titanium films deposited under higher Ar gas pressures than usual were observed. Black titanium films were deposited at a pressure of around 12 Pa on stainless steel wires and Cu thin plates, although glossy films were obtained at lower pressures. The black titanium films had a larger apparent thickness than the glossy films. Scanning electron microscopic observation of the films showed that the black films have an extremely porous structure, consisting of separated columns with periodic steps on the lateral surfaces. This morphology indicates that the nuclei formed on the substrate grow periodically to form steps due to the shadowing effect. The surface areas of the black films on the Cu thin plates varied with bias potential. A small negative bias was found to be effective for increasing the surface area of black titanium films. These results suggest that porous TiO<SUB>2</SUB> films can be prepared by applying a suitable oxidation process to the black titanium film which consists of separated columns.
日本真空協会の論文
1996-08-20