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Wafer Masters, Inc. | 論文
- Homoepitaxial Chemical Vapor Deposition of 6H-SiC at Low Temperatures on {011^^-4} Substrates
- Photoluminescence of Ti Doped 6H-SiC Grown by Vapor Phase Epitaxy
- Thermal Behavior of Large-Diameter Silicon Wafers during High-Temperature Rapid Thermal Processing in Single Wafer Furnace
- Design of Single-Wafer Furnace and Its Rapid Thermal Processing Applications
- Single Wafer Furnace and Its Thermal Processing Applications
- Slip-Free Rapid Thermal Processing in Single Wafer Furnace
- Titanium Silicide Formation and Anneal Using a Susceptor-Based Low Pressure Rapid Thermal Processing System
- Highly Reliable, Backside Emissivity Independent Cobalt Silicide Process Using a Susceptor-Based Low Pressure Rapid Thermal Processing System