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ULSI Laboratory, Mitsubishi Electric Corp. | 論文
- SiO_2 Etching in C_4F_8/O_2 Electron Cyclotron Resonance Plasma
- Analysis of Fluorocarbon Deposition during SiO_2 Etching
- Mechanism of AlCu Film Corrosion
- Direct Observation of Crystal-Originated Particles on Czochralski-Grown Silicon Wafer Surface and Effect on Gate Oxide Reliability
- Test Structure for the Evaluation of Si Substrates (Special Issue on Microelectronic Test Structure)