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Tokyo Ohka Kogyo Co., Ltd. | 論文
- Low-E_a Chemical Amplification Resists for 193nm Lithography
- X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
- Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Proton Dynamics in Chemically Amplified Electron Beam Resists
- Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography
- Reaction Mechanisms of Brominated Chemically Amplified Resists
- 高速金バンプ用耐クラックおよび微細プロファイルフォトレジスト〔英文〕 (電子材料技術の新展開)
- Studies of the Photo Acid Generator Material Design for Chemically Amplified Photoresists
- Reactivity of Halogenated Resist Polymer with Low-Energy Electrons
- Proton Dynamics in Chemically Amplified Electron Beam Resists
- Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography