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The Institute of Scientific and Industrial Research, Ôsaka University | 論文
- Does the Macrostructure of Deoxyribonucleic Acid Molecules Adsorbed on Substrates by the Pulse Injection Method Reflect That in Solution?
- Real Space Observation of Double-Helix DNA Structure Using a Low Temperature Scanning Tunneling Microscopy
- Fusicocca-3(16), 10(14)-diene, and β- and δ-Araneosenes, New Fusicoccin Biosynthesis-related Diterpene Hydrocarbons from Phomopsis amygdali
- Asymmetric Addition Reaction of Phenyllithium to 1,2-Ethylenediimine with the Aid of A Chiral Ligand
- A Square Cyclic Porphyrin Dodecamer : Synthesis and Single-Molecule Characterization
- Formation and Surface Acoustic Wave Properties of LiNbO_3/AlN/Sapphire
- Electric and Pyroelectric Behaviors of PbTiO_3 Thin Films Formed by an Excimer Laser Ablation Technique
- Preparation of PbTiO_3 Thin Films by an Excimer Laser Ablation Technique with Second Laser Irradiation
- Observation of Resistive and Magnetic Anomalies at 90-180 K in Artificially Layered Ca_Sr_xCuO_2 Thin Films Grown by Laser Molecular Beam Epitaxy
- Effect of Ba Addition on the Properties of Bi-Pb-Sr-Ca-Cu-O Superconductors : Electrical Properties of Condensed Matter
- Strain Mechanism of LiNbO_3/Sapphire Heterostructures Grown by Pulsed Laser Deposition
- Surface Acoustic Wave Properties of Lithium Tantalate Films Grown by Pulsed Laser Deposition
- Superconductivity im Artificially Layered Ba-Ca-Cu-O Thin Films
- 2P-259 人口平面膜法とAFMを融合させた膜蛋白質の電流、力同時計測手法の開発(計測,第47回日本生物物理学会年会)
- Relationship between Resolution, Line Edge Roughness, and Sensitivity in Chemically Amplified Resist of Post-Optical Lithography Revealed by Monte Carlo and Dissolution Simulations
- Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists for Extreme Ultraviolet Lithography
- Stroboscopic Picosecond Pulse Radiolysis Using Near-Ultraviolet-Enhanced Femtosecond Continuum Generated by CaF_2
- Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography
- Delocalization of Positive and Negative Charge Carriers on Oligo- and Poly-fluorenes Studied by Low-Temperature Matrix Isolation Technique
- Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application