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The Institute of Scientific and Industrial Research, Ôsaka University | 論文
- Anisotropic Residual Resistivity under High Pressure in UIr (Proceedings of the 5th International Symposium on Advanced Science Research in Celebration of the World Year of Physics 2005(ASR-WYP-2005): Advances in the Physics and Chemistry of Actinide Comp
- XPS Study of Gd-Co and Gd-Fe Amorphous Films
- A Consideration of the Chemical Shift in ESCA Spectra from Oxide/Semiconductor Interface
- Effects of Water Vapor and Oxygen Excitation on Oxidation of GaAs, GaP and InSb Surfaces Studied by X-Ray Photoemission Spectroscopy
- Determination of Depth Profiles by Angular Dependent X-Ray Photoelectron Spectra
- An XPS Analysis of Thermally Grown Oxide Film on GaP
- X-Ray Photoemission Study of the Interaction of Oxygen and Air with Cleaved GaAs (110) Surfaces
- 2P186 Single-molecule measurement of F_0F_1 rotation in living E. coli(The 48th Annual Meeting of the Biophysical Society of Japan)
- Tailored Thin Films of Superconducting Bi-Sr-Ca-Cu Oxide Prepared by Excimer Laser Ablation Technique
- Formation of the High-T_c Phase of the Superconducting Bi-Pb-Sr-Ca-Cu-O Thin Film by the Laser Ablation Method
- Left Cervical Aortic Arch With Aortic Coarctation and Saccular Aneurysm
- Purification and Properties of Phenylethylamine Oxidase of Arthrobacter globiformis
- Thermal Cyclization of Nonconjugated Aryl-Yne-Carbodiimide Furnishing a Dibenzonaphthyridine Derivative
- Tunneling Spectroscopy Analysis of Hexachloro-Fluorescein Phosphoramidite Fluorescent Dye Attached to Deoxyribonucleic Acid
- Characteristics of Alkali-sensitive Mutants of Alkaliphilic Bacillus sp. Strain C-125 That Show Cellular Morphological Abnormalities
- Diffuse Scattering in the High-Temperature(1×1)State of Si(111)
- Surface Plasmon Dispersions of Ag Adsorbed Si(111) Surfaces Studied by Angle-Resolved Electron Energy Loss Spectroscopy
- Inelastic Low Energy Electron Diffraction Measurements of Hydrogen Adsorbed Si (001) Surfaces: 2×1:H and 1×1: :2H
- Enhancement of Surface Plasmon excitation by Low-Energy Electron due to Surface Resonance on Si (001)-2×1
- Dispersion of Surface-Plasmon at Clean Si(001)-2×1 Surface