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The Institute of Scientific and Industrial Research, Ôsaka University | 論文
- 70 (R)-3-ヒドロキシ酪酸よりチエナマイシンおよび1β-メチルカルバペネムの合成研究
- "Molecular Magic". Formation of a Self-inclusion Complex from a Dumbbell-shaped Permethylated β-Cyclodextrin Derivative
- Dependence of Outgassing Characters at a 157 nm Exposure on Resist Structures
- Selective Adsorption of DNA onto SiO_2 Surface in SiO_2/SiH Pattern
- Electrical Properties of Poly(dA)・Poly(dT) and Poly(dG)・Poly(dC) DNA
- Formation of a High-Electrical-Resistance Region in InP by Ga Ion Implantation
- Photocatalytic Activity of Titanium Dioxide Loaded with Cerium Oxide
- Evolution of Fermi Surface Properties in Ce_xLa_B_6 and Pr_xLa_B_6(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- Humidity Dependence of Electrical Resistivity in Poly(dG)・Poly(dC) DNA Thin Film
- Hydration Effects on the Microwave Dielectricity in Dry Poly(dA)-Poly(dT) DNA(Cross-disciplinary physics and related areas of science and technology)
- Single Crystal Growth and Fermi Surface Property in ThRhIn_5(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- Observation of Symmetry Lowering Associated with the Metal-Insulator Transition in SmRu_4P_ by ^Ru-NQR(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- Transport and Magnetic Properties of Pressure-Induced Insulating Phase in PrFe_4P_(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- Measurement Environment Dependency of Single Molecule Conductance
- Analysis of Non-Uniform Boron Penetration of Nitrided Oxide in PMOSFETs Considering Two-Dimensional Nitrogen Distribution
- Growth of Oriented NiS Films on Si(111) and Al_2O_3(012) Substrate by Pulsed Laser Ablation
- A NEW METHOD FOR THE SPECTROPHOTOMETRIC DETERMINATION OF ALIPHATIC AMINES WITH A"CROWNED"DINITROPHENYLAZOPHENOL-Ba (II) COMPLEX
- Performance of the Charge-Coupled Device for Direct X-ray Detection in the Energy Range of 1-9 keV at the Synchrotron Radiation Facility
- Dissolution Rate Analysis of ArF Resists Based on the Percolation Model
- Bottom Extreme-Ultraviolet-Sensitive Coating for Evaluation of the Absorption Coefficient of Ultrathin Film