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Semiconductor Research Center Matsushita Electric Ind. Co. Ltd. | 論文
- Suppressing Ion Implantation Induced Oxide Charging by Utilizing Physically Damaged Oxide Region
- Growth of the 2223 Phase in Leaded Bi-Sr-Ca-Cu Oxide under Reduced Oxygen Partial Pressure
- Growth of the 2223 Phase in Leaded Bi-Sr-Ca-Cu-O System : Electrical Properties of Condensed Matter
- A New Mode of Modulation Observed in the Bi-Pb-Sr-Ca-Cu-O System : Electrical Properties of Condensed Matter
- Transmission Electron Microscope Studies of Intergrowth in BiSrCaCu_2O_x and High-T_c Superconducting Phase : Electrical Properties of Condensed Matter
- Effects of Oxygen-Potential-Controlled Annealing on the Superconducting Properties of (Bi, Pb)_2Sr_2Ca_2Cu_3O_y Thin Films
- Control of Pre-Tilt Angles of Liquid Crystal Molecules Using a Chemically Adsorbed Monomolecular Layer as an Alignment Film in Liquid Crystal Cells
- Applications of a Chemically Adsorbed Monomolecular Layer Having a Fluorocarbon Chain as an Anti-Contamination Film
- A Liquid Crystal Display Having a Rubbing-Free Photo-Aligned Monomolecular Layer as an Alignment Film
- Experiments on Discrimination between the Same Materials of Different Grain Size
- Ocean Experiments to Discriminate Seabed Materials by Echo Pulse and Neural Network at Uchiura Bay
- Development of Actuators for Small-Size Magneto-Optical Disk Drives : Head Technology
- Development of Actuators for Small-Size Magneto-Optical Disk Drives
- Effects of Film Thickness and Annealing Conditions on 2223 Phase Growth in BSCCO Films Produced by Pb Vapor Doping
- Formation of Thermally Stable Multilayered BSCCO Films with 2223, 2234 and 2245 Structures
- Preparation of Multilayers by Alternate Cycles of Chemical Adsorption and Electron Beam Irradiation
- Growth of the 2223 Phase in Bi-Sr-Ca-Cu Oxide Films under a Controlled Pb Potential
- Synthesis of Artificially Layered Bi-Sr-Ca-Cu Oxide Films and Their Thermal Stability
- A New Photobleachable Positive Resist for KrF Excimer Laser Lithography : Advanced III-V Compound Semiconductors and Silicon Devices(Solid State Devices and Materials 1)
- A KrF Excimer Laser Lithography for Half Micron Devices : Techniques, Instrumentations and Measurement