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School Of Materials Science And Engineering Seoul National University | 論文
- Orientation Distribution of Proeutectoid Ferrite Nucleated at Prior Austenite Grain Boundaries in Vanadium-added Steel
- Precipitation and Recrystallization Behavior in Extra Low Carbon Steels
- 3D Numerical Analysis on Electromagnetic and Fluid Dynamic Pheonomena in a Soft Contact Electromagnetic Slab Caster
- Numerical Analysis on Cold Crucible Using 3D H-φ Method and Finite Volume Method with Non-staggered BFC Grid System
- Carbazole-based Photorefractive Organic Glass Showing High Diffraction Efficiency at Low External Electric Field
- Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition
- Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition
- Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition
- Investigation of Ru/TiN Bottom Electrodes Prepared by Chemical Vapor Deposition
- Preparation of Modified Lead Zinc Niobate Compound Thick Films by Rapid Quenching
- Control of the Microstructure of (Pb, La) TiO_3 Thin Films by Metal-Organic Chemical Vapor Deposition Using a Solid Delivery System for Ferroelectric Domain Memory
- Numerical Analysis of the Influences of Operational Parameters on the Fluid Flow and Meniscus Shape in Slab Caster with EMBR
- Compositional variation of magnetoresistance characteristics in NiFe/Cu/Co spin valve thin films
- Effects of tilt-cut Si substrates on crystal structure and magnetic anisotropy of metallic ferromagnetic thin films
- NiFeCo/Cu/Co System for Magnetoresistive Random Access Memory (MRAM)
- NiFeCo/Cu/Co System for Magnetoresistive Random Access Memory (MRAM)
- Role of a Defect in a Corrugated Interface of a Layered Composite in Controlling Crack Propagation Mechanisms
- Studies on the Formation of SiO_2 Films Using Liquid Phase Deposition Method and Their Basic Characteristics Related with the Application to Electronic Devices
- Studies on the Formation of SiO_2 Films Using Liquid Phase Deposition Method and Their Basic Characteristics Related with the Application to Electronic Devices
- Studies on the Formation of SiO_2 Films Using Liquid Phase Deposition Method and Their Basic Characteristics Related with the Application to Electronic Devices