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SAMCO INTERNATIONAL Co., Ltd. | 論文
- Materials Characterization of Plasma Deposited Copolymer Using CFC-113 With C_2H_4 Monomer
- Large-Area Deposition of Tin Oxide Film by Photochemical Vapour Deposition (第38回真空に関する連合講演会プロシ-ディングス(1997年11月5日〜7日,東京))
- Improvement in Homogeneity and Ferroelectric Property on Mist Deposition Derived Pb(Zr, Ti)O_3 Thin Films by Substrate Surface Treatment
- Optimization of Amorphous Carbon-Deposited Antireflective Layer for Advanced Lithography
- New Plasma Surface Treatment for Wire Bonding Process : Effect of Sublimation with Alkyl Group Radicals
- A New Plasma Process for Surface Treatment prior to Wire Bonding that Utilizes the Sublimation Effect of Alkyl Group Radicals