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RIKEN, The Institute of physical and Chemical Research | 論文
- Coupling of ICP-MS and Multitracer Technique as a New Method to Investigate Dynamics of Various Elements in Soil-water System
- Fabrication of Periodic Structures in GaAs by Focused-Ion-Beam Implantation : Microfabrication and Physics
- Fabrication of Periodic Structures in GaAs by Focused-Ion-Beam Implantation
- 40 nm Width Structure of GaAs Fabricated by Fine Focused Ion Beam Lithography and Chlorine Reactive Ion Etching : Techniques, Instrumentations and Measurement
- FIB Exposure Characteristics of LB Film
- Crystal Growth of Nd:YAG Laser Films on Various Substrates by Pulsed Laser Deposition
- Wide-Band Frequency Response Measurements of IR and FIR Detectors by Diode-CO_2 Laser Heterodyne Detection
- Microbial Preparation of Guanosine 7-N-Oxide
- Induced Resistance to Rice Blast by Antagonistic Bacterium, Serratia marcescens Strain B2
- Effects of light conditions on prodigiosin stability in the biocontrol bacterium Serratia marcescens strain B2
- Induced Defects in GaAs Etched by Low Energy Ions in Electron Beam excited Plasma(EBEP) System : Etching and Deposition Technology
- Maskless Etching of AN Using Focused Ion Beam
- Maskless Ion Beam Assisted Etching of Si Using Chlorine Gas
- New Etching System with a Large Diameter Using Electron Beam Excited Plasma
- Measurement of the Energy Spread of the Cold Relativistic Electron Beam Using Thomson Backscattering of a High Power CO_2 Laser
- Large Vessels of High-T_c Bi-Pb-Sr-Ca-Cu-O Superconductor for Magnetic Shield
- Magnetic Shield of High-T_c Oxide Superconductors at 77 K
- Selective Etching of AI_2O_3 on GaAs using Excimer Lasers : Etching
- Selective Etching of Al_2O_3 on GaAs using Excimer Lasers
- Layer-By-Layer Controlled Digital Etching by Means of an Electron-Beam-Excited Plasma System : Etching and Deposition Technology