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Process Development Team. Samsung Electronic Co., Ltd. | 論文
- Flare in Microlithographic Exposure Tools
- Cyclopropyl-containing Photoacid Generators for Chemically Amplified Resists
- Most Efficient Alternative Manner of Patterning sub-80nm Contact Holes and Trenches with 193nm Lithography
- Quantitative Evaluation of Grid Size Effect on Critical Dimension Uniformity Improvement