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Material And Life Science Graduate School Of Engineering Osaka University | 論文
- A Novel Method for the Preparation of Green-photoluminescent Zinc Oxide by Microwave-assisted Carbothermal Reduction
- Microwave-assisted Preparation of Silver Nanoparticles
- Pore Size Distribution and Porosities of Nano-TiO_2 Films Made by Using Cellulosic Thickener and Their Influence on Performance of Dye-Sensitized Solar Cells
- Detoxification of Chlorinated Aromatics Adsorbed on Fly Ash under Microwave Irradiation(Chemical Applicatio)(Recent Trends on Microwave and Millimeter Wave Application Technology)
- Detoxification of Chlorinated Aromatics Adsorbed on Fly Ash under Microwave Irradiation
- Aggregation through the Quadrupole Interactions of Gold(I) Complex with Triphenylphosphine and Pentafluorobenzenethiolate
- Temperature-Dependent Solid-state Luminescence and Reversible Phase Transition of (n-Bu_4N)[Au(SC_6H_3-3, 5-Me_2)_2]
- EuO Nanocrystal Formation under ArF Laser Irradiation
- Size Selective Synthesis of Surface-modified EuS Nanocrystals Using Pyridine and Their Physical Properties
- The Effect of MgO on the Enhancement of the Efficiency in Solid-State Dye Sensitized Photocells Fabricated with SnO_2 and CuI
- Application of Poly(3,4-ethylenedioxythiophene) to Counter Electrode in Dye-Sensitized Solar Cells
- Microwave-Driven Polyol Method for Preparation of TiO_2 Nanocrystallites
- Quasi-Solid-State Dye-Sensitized Solar Cell with Ionic Polymer Electrolyte
- Dye-sensitized Solar Cells Using Brookite Nanoparticle TiO_2 Films as Electrodes
- Characterization of HfO_2 Films Prepared on Various Surfaces for Gate Dielectrics(High-κ Gate Dielectrics)
- Characterization of HfO_2 Films Prepared on Various Surfaces for Gate Dielectrics
- Selective Inclusion Phenomena in Lithocholamide Crystal Lattices; Design of Bilayered Assemblies through Ladder-type Hydrogen Bonding Network
- 色素太陽電池における酸化チタン電極の電子輸送
- New Technologies of KrF Excimer Laser Lithography System in 0.25 Micron Complex Circuit Patterns (Special Issue on Quarter Micron Si Device and Process Technologies)
- Quarter Micron KrF Excimer Laser Lithography (Special Issue on Sub-Half Micron Si Device and Process Technologies)