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Lg Semicon. Ltd. | 論文

• Study of Drain Contact Structure Dependent Deep Submicron MOSFET Reliability by Photon Emission Analysis
• Column Reference 1T1C Ferroelectric Memory
• Column Reference 1T1C Ferroelectric Memory
• Column Reference 1T1C Ferroelectric Memory
• Shallow Trench Isolation Characteristics with High-Density-Plasma (HDP) CVD Oxide for Deep-Submicron CMOS Technologies
• Shallow Trench Isolation Characteristics with High-Density-Plasma (HDP) CVD Oxide for Deep-Submicron CMOS Technologies
• Shallow Trench Isolation Characteristics with High-Density-Plasma (HDP) CVD Gap-Fill Oxide for Deep-Submicron CMOS Technologies
• Improvement of coercivity and microstructure of Nd_Fe_B_ melt-spun ribbons by addition of Zn

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