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Joining and Welding Research Institute Osaka University | 論文
- Wetting, Adhesion and Adsorption in Al-Si/(0112) α-Alumina System at 1723K
- Phase Formation during Deposition of TiO_2 Coatings through High Velocity Oxy-Fuel Spraying
- Welding of Aluminum Alloy with High Power Direct Diode Laser(Physics, Processes, Instruments & Measurements)
- Interfacial Microstructure of Silicon Carbide and Titanium Aluminide Joints Produced by Solid-State Diffusion Bonding
- Solid State Diffusion Bonding of Silicon Nitride Using Vanadium Foils
- Solid State Diffusion Bonding of Silicon Nitride with Vanadium Foils(Materials, Metallurgy & Weldability)
- Effects of Ion-Beam-Irradiation on Morphology and Densification of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition
- Spectroscopic Measurement of Plume in Laser PVD Process
- Mathematical Modeling of Fusion and Solidification in Laser Welding and Evaluation of Hot Cracking Susceptibility
- FRICTION STIR LAP JOINING OF PURE TITANIUM
- Effect of Intermetallic Compound Layer on Tensile Strength of Dissimilar Friction-Stir Weld of a High Strength Mg Alloy and Al Alloy
- Development of Microstructure and Mechanical Properties in Laser-FSW Hybrid Welded Inconel 600
- Enhanced Models of Heat Sources in Welding and Plasma Spraying (2-nd Report) : Examples of Thermal Plasma Models
- Enhanced Method of Heat Sources in Welding and Plasma Spraying (1st Report) : Overview of Simple Thermal Plasma Models
- New Concept for the Characteristic of an Arc Welding Power Source (Report II) : New Development of Arc Control System for CO_2 Welding(Physics, Processes, Instruments & Measurements)
- New Concept for the Characteristic of an Arc Welding Power Source (Report I) : Application in Pulsed MIG/MAG Welding(Physics, Processes, Instruments & Measurements)
- Annealing of Se^+-Implanted GaAs Encapsulated with As-Doped a-Si:H
- Electron Beam Melting of Aluminum Alloy by Beam Oscillation(Physics, Process, Instrument & Measurement)
- Electron Beam Welding of Zr_Cu_Ni_Al_ Bulk Glassy Alloys
- Influence of Substrate Biasing on (Ba, Sr)TiO_3 Films Prepared by Electron Cyclotron Resonance Plasma Sputtering
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