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Institute for Semiconductor Technologies, ULVAC, Inc. | 論文
- Etching Characteristics of Organic Polymers in the Magnetic Neutral Loop Discharge Plasma
- Investigations of Surface Reactions in Neutral Loop Discharge Plasma for High-Aspect-Ratio SiO_2 Etching
- Control of Surface Reaction on Highly Accurate Low-k Methylsilsesquioxane Etching Process : Nuclear Science, Plasmas, and Electric Discharges
- Conelike Defect in Deep Quartz Etching Employing Neutral Loop Discharge
- Effect of auxin on the incorporation of proline into the naked protoplasm of Chara globularis
- Organic Low-k Dielectric Material Etching by CH_3NH_2/N_2 Plasma